All Products
-
DavidGood company with nice service and high quality and high reputation. One of our reliable supplier , goods are delivered in time and nice package. -
John MorrisMaterial experts, rigorous processing, timely discovery of problems in design drawings and communication with us, thoughtful service, reasonable price and good quality, I believe we will have more cooperation. -
JorgeThank you for your good after-sales service. Excellent expertise and technical support helped me a lot. -
PetraThrough very good communication all problems solved, satisfied with my purchase -
Adrian HayterThe goods purchased this time are very satisfied, the quality is very good, and the surface treatment is very good. I believe we will order the next order soon.
Contact Person :
Nicole
Phone Number :
13186382597
Whatsapp :
+8613186382597
PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating
Contact me for free samples and coupons.
Whatsapp:0086 18588475571
Wechat: 0086 18588475571
Skype: sales10@aixton.com
If you have any concern, we provide 24-hour online help.
xProduct Details
| Name | PVD Coating Tantalum Target | Grade | Ta1 Ta2 RO5200 RO5400 RO5252 RO5255 |
|---|---|---|---|
| Purity | ≥99.95% | Density | 16.68g/cm3 |
| Surface | Machined Surface | Standard | ASTM B708 |
| Delivery Status | Annealed | Shape | Flat Target Rotating Target Special-shaped Customization |
| Highlight | Optical Coating Tantalum Target,PVD Coating Tantalum Sputtering Target,Semiconductor Coating Tantalum Sputtering Target |
||
Product Description
Product Information:
| Name | PVD coating tantalum target |
| Grade | Ta1 Ta2 RO5200 RO5400 RO5252 RO5255 |
| Purity | ≥99.95% |
| Density | 16.68g/cm3 |
| Surface | Machined surface, no pits, scratches, stains, burrs and other defects |
| Standard | ASTM B708 |
| Shape | Flat target, Rotating target ,Special-shaped customization |
Chemical Content of PVD Coating Tantalum Target:
| Grade | Main elements | Impurity content less than % | |||||||||||
| Ta | Nb | Fe | Si | Ni | W | Mo | Ti | Nb | O | C | H | N | |
| Ta1 | Remain | —— | 0.005 | 0.005 | 0.002 | 0.01 | 0.01 | 0.002 | 0.04 | 0.02 | 0.01 | 0.0015 | 0.01 |
| Ta2 | Remain | —— | 0.03 | 0.02 | 0.005 | 0.04 | 0.03 | 0.005 | 0.1 | 0.03 | 0.01 | 0.0015 | 0.01 |
| TaNb3 | Remain | ＜3.5 | 0.03 | 0.03 | 0.005 | 0.04 | 0.03 | 0.005 | —— | 0.03 | 0.01 | 0.0015 | 0.01 |
| TaNb20 | Remain | 17.0～23.0 | 0.03 | 0.03 | 0.005 | 0.04 | 0.03 | 0.005 | —— | 0.03 | 0.01 | 0.0015 | 0.01 |
| Ta2.5W | Remain | 0.005 | 0.005 | 0.002 | 3 | 0.01 | 0.002 | 0.04 | 0.02 | 0.01 | 0.0015 | 0.01 | |
| Ta10W | Remain | 0.005 | 0.005 | 0.002 | 11 | 0.01 | 0.002 | 0.04 | 0.02 | 0.01 | 0.0015 | 0.01 | |
Feature of PVD Tantalum Target:
High melting point,
Low steam pressure,
Good cold working performance,
High chemical stability,
Strong resistance to liquid metal corrosion,
The surface oxide film has a large dielectric constant
Application:
The tantalum target and the copper back target are welded, and then semiconductor or optical sputtering is performed, and the tantalum atoms are deposited on the substrate material in the form of oxides to achieve sputtering coating; tantalum targets are mainly used in semiconductor coating, optical coating and other industries . In the semiconductor industry, metal (Ta) is currently mainly used to coat and form a barrier layer through physical vapor deposition (PVD) as a target material.
We can process according to customer's drawing, and produce Ta rod,plate,wire,foil,crucible etc.
Please send us an inquiry for more information
Recommended Products