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RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD
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xProduct Details
| Name | Tantalum Rotating Target | Grade | RO5200,RO5400,RO5252,RO5255,Ta1 ,Ta2 |
|---|---|---|---|
| Density | 16.68 G/cm3 | Atomic Weight | 180.94788 |
| Sputtering Method | DC | Thermal Conductivity | 57 W/m.K |
| Highlight | CVD Tantalum Rotating Target,Ta1 Tantalum Target,Tantalum Tube Target 100mm |
||
Product Description
Product Information:
Tantalum tube target is a tubular tantalum target, also known as tantalum rotating target.
| Name | Tantalum Rotating Target Tantalum Tube Target |
| Purity | ≥99.95% |
| Grade | RO5200,RO5400,RO5252,RO5255,Ta1,Ta2 |
| Density | 16.68g/cm3 |
| Atomic weight | 180.94788 |
| Sputtering method | DC |
| Thermal conductivity | 57 W/m.K |
| Thermal expansion coefficient | 6.3 x 10-6 /K |
| Size | OD: 20~300mm Wall thickness: ≥ 0.5mm |
Application of Ta Rotating Target:
Tantalum tube target is a high-purity tantalum raw material for sputter deposition, which can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Details are as follows:
-For semiconductors;
-Chemical Vapor Deposition (CVD) displays;
-Physical Vapor Deposition (PVD) displays;
-Optical applications.
Note: We provide customized services. If you can't find the target you want, please contact us directly. We can customize according to your requirements.
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